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1. Identificação
Tipo de ReferênciaArtigo em Revista Científica (Journal Article)
Sitemtc-m16.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador6qtX3pFwXQZsFDuKxG/CxdgB
Repositóriosid.inpe.br/marciana/2004/06.22.10.27   (acesso restrito)
Última Atualização2015:11.18.11.44.23 (UTC) marciana
Repositório de Metadadossid.inpe.br/marciana/2004/06.22.10.27.58
Última Atualização dos Metadados2018:06.05.01.28.40 (UTC) administrator
Chave SecundáriaINPE-10739-PRE/6198
ISBN/ISSN0925-9635
ISSN0925-9635
Chave de CitaçãoFerreiraCoraTravLeit:2000:OEStPl
TítuloOES study of the plasma during CVD diamond growth using CCl4/H-2/O-2 mixtures
Ano2000
Mêsapr-may
Data de Acesso18 maio 2024
Tipo SecundárioPRE PI
Número de Arquivos1
Tamanho324 KiB
2. Contextualização
Autor1 Ferreira, Neidenei Gomes
2 Corat, Evaldo Jose
3 Trava-Airoldi, Vladimir Jesus
4 Leite, Nelia Ferreira
Grupo1 LAS-INPE-MCT-BR
Afiliação1 Instituto Nacional de Pesquisas Espaciais - LAS
2 Universidade São Francisco - Itatiba
RevistaDiamond and Related Materials
Volume9
Número3-6
Páginas368-372
Histórico (UTC)2015-11-18 11:44:11 :: administrator -> marciana :: 2000
2015-11-18 11:44:23 :: marciana -> administrator :: 2000
2018-06-05 01:28:40 :: administrator -> marciana :: 2000
3. Conteúdo e estrutura
É a matriz ou uma cópia?é a matriz
Estágio do Conteúdoconcluido
Transferível1
Tipo do ConteúdoExternal Contribution
Tipo de Versãopublisher
Palavras-Chavediamond films
gas phase
halide chemistry
optical spectroscopy
ResumoGeneration of atomic hydrogen in H-2/Ar/CCl4 microwave discharges with O-2 addition has been investigated, in situ mass spectrometry and emission hydrogen-atom actinometry have been used in the microwave-plasma-assisted chemical vapor deposition (MWPACVD) reactor. Optical emission spectroscopy (OES) was used to study the intensity of H-alpha, H-beta and H-gamma lines using argon as actinometer. The results showed different increases in the atomic hydrogen concentration for the three hydrogen lines analyzed for additions of up to 1.5% CCl4. These results confirm a previous study on the validity of the OES technique using the H-gamma line intensity. An additional increase in the atomic hydrogen generation was also observed when O-2 was added to the H-2/CCl4 mixtures. Chemical reaction products, detected by exhaust-gas mass spectrometry, showed that CCl4 is completely dissociated in the plasma reactor with a fast conversion into hydrocarbons. The effects of O-2 addition lead an increase in CO and H2O formation associated with a decrease in CH4 and C2H2 concentration. Oxygen decreases the hydrocarbon concentration for high concentrations of halogenated precursor. This behavior inhibits the formation of solid carbon observed in mixtures with chlorine and permits the production of good-quality CVD diamond films owing to the high generation of atomic hydrogen. The films grown in different concentrations of CCl4 and O-2 were analyzed by scanning electron microscopy and Raman spectroscopy. (C) 2000 Elsevier Science S.A. All rights reserved.
ÁreaFISMAT
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4. Condições de acesso e uso
Idiomaen
Arquivo Alvo2000_ferreira.pdf
Grupo de Usuáriosadministrator
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Grupo de Leitoresadministrator
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Visibilidadeshown
Detentor da CópiaSID/SCD
Política de Arquivamentodenypublisher denyfinaldraft24
Permissão de Leituradeny from all and allow from 150.163
Permissão de Atualizaçãonão transferida
5. Fontes relacionadas
Unidades Imediatamente Superiores8JMKD3MGPCW/3ESR3H2
DivulgaçãoWEBSCI; PORTALCAPES; COMPENDEX.
Acervo Hospedeirosid.inpe.br/banon/2003/08.15.17.40
6. Notas
Campos Vaziosalternatejournal archivist callnumber copyright creatorhistory descriptionlevel doi e-mailaddress electronicmailaddress format isbn label lineage mark mirrorrepository nextedition notes orcid parameterlist parentrepositories previousedition previouslowerunit progress project resumeid rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url
7. Controle da descrição
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